Compact UV nanosecond solid-state laser systems
Product: Compact UV nanosecond solid-state laser systems of the “MOPA” series at 355 nm, 266 nm and 213 nm for laser marking of transparent substrates. Different models with pulse energies up to 200 uJ, average powers up to 200 mW and repetition frequencies up to 20 kHz are available.
Features: The laser systems are based on a diode-pumped, passively Q-switched YAG laser (master oscillator), which is followed by a diode-pumped optical amplifier (power amplifier). This MOPA principle enables higher pulse energies than achieved by unamplified systems. Thanks to the integrated frequency conversion, the wavelength is converted internally to 355 nm, 266 nm or 213 nm using nonlinear optical processes. Due to the microchip design used, short pulse lengths in the range of 1 ns are achieved, which lead to high pulse peak powers of up to 200 kW.
The lasers are compact, robust and easy to integrate. Due to the high efficiency, the lasers can be cooled completely passively. In order to avoid long-term degradation and loss of performance, the lasers are manufactured in clean rooms and sealed against contamination. All lasers are equipped with PC-based interfaces, which make it possible to optimize central laser parameters in the field without having to return the devices for service. This guarantees high availability and low downtimes.
Typical applications: micro machining, marking of glasses, plastics and other transparent substrates, as well as fundamental investigations in the fields of semiconductor research and life science. Laser sources at wavelengths of 532 nm and 1064 nm are available for other applications as well.